The tubular PECVD (plasma enhanced chemical vapor deposition) electric furnace has multiple advantages, and the following are its main advantages:
Commonly used tubular PECVD electric furnace (click on the image to view product details)
High thin film deposition rate: The tubular PECVD electric furnace greatly improves the deposition rate of thin films through radio frequency glow technology. The sedimentation rate can reach a high level, which greatly shortens the production cycle and improves production efficiency.
High area uniformity: By using excellent multi-point RF feeding technology, special gas path distribution, and heating technology, the uniformity index of the film reaches a high level. This ensures consistency in product quality and reduces the scrap rate during the production process.
High concentration and high precision: In applications such as the semiconductor industry, tubular PECVD electric furnaces can achieve small deviations between deposited substrates, ensuring high concentration and high precision of products.
High process stability: The high stability of the equipment ensures the continuity and stability of the production process, reduces fluctuations and uncertainties in the production process, and improves the reliability and consistency of the product.
High adhesion: The plasma generator of the tubular PECVD equipment can generate high-energy plasma, which enhances the adhesion between the generated film and the sample surface, thereby improving the durability and reliability of the product.
Multifunctionality: The tubular PECVD electric furnace can be used not only for growing various thin films such as metal films, ceramic films, composite films, but also for vacuum coating, preparation of nano thin film materials, and expansion of plasma cleaning and etching functions. This makes the tubular PECVD electric furnace have broad application prospects in multiple fields.
Intelligent control: modern tubular PECVD electric furnace is usually equipped with good control systems, such as fully automatic intelligent control system, which can realize centralized adjustment and control of heating control, plasma RF control, gas flow control and vacuum system control. This greatly simplifies the operation process, improves the usability and production efficiency of the equipment.
Safety and reliability: The design of the tubular PECVD electric furnace fully considers safety and reliability. For example, the safety and stability of the equipment during operation are ensured through real-time monitoring of the pressure inside the pipe and automatic balancing, intelligent gas circuit on/off, and timed control of RF power and switches.
Rotating and tilting PECVD electric furnace (click on the image to view product details)
Overall, tubular PECVD electric furnaces have significant advantages in the field of thin film deposition, which make them widely applicable and promising in various fields such as manufacturing, medicine, and materials science.Click to learn more PECVD devices! Or click on online customer service to learn more about product information!