What metals are suitable for CVD electric furnaces to process?

CVD electric furnace, also known as chemical vapor deposition (CVD) tube furnace, is a widely used heat treatment equipment in the fields of materials science and engineering. It prepares thin films, nanoparticles, and other novel materials by transporting a gas mixture into a furnace and decomposing the gas at high temperatures, resulting in the deposition of atoms or molecules on a solid substrate. Let’s take a look at which metals CVD electric furnaces are suitable for processing!

A commonly used low vacuum CVD electric furnace (click on the image to view product details)

Tungsten (W): Tungsten is a high melting point, high hardness metal commonly used in applications under high temperature, high vacuum, and strong corrosive environments. CVD electric furnace can be used to deposit tungsten thin films to meet the needs of specific fields.
Titanium (Ti): Titanium has excellent corrosion resistance, high strength, and low density, and is widely used in aerospace, medical, and other fields. CVD electric furnace can deposit titanium thin film or titanium nitride (TiN) thin film to improve the performance of materials.
Aluminum (Al): Aluminum is a lightweight, corrosion-resistant metal commonly used in fields such as aerospace, automotive, and construction. CVD electric furnaces can be used for the deposition of aluminum films to meet the requirements of related applications.
In addition, CVD electric furnaces can also be used to deposit other metal thin films, such as copper (Cu), nickel (Ni), etc., depending on the application field and the performance requirements of the required materials.

In addition to the deposition of metal thin films, CVD electric furnaces are also used in the semiconductor industry to deposit insulation layers (such as silicon dioxide SiO ₂ and silicon nitride Si ∝ N ₄), doping layers (such as phosphosilicate glass PSG and borosilicate glass BSG), high-k dielectric materials (such as hafnium oxide HfO ₂ and zirconium oxide ZrO ₂), and barrier layers (such as titanium nitride TiN and tantalum nitride TaN). These materials play a crucial role in the manufacturing of semiconductor devices.

Customized slide CVD electric furnace (click on the image to view product details)

In general, CVD electric furnaces are suitable for processing various metals, including tungsten, titanium, aluminum, etc., and can deposit different types of metal films according to specific application requirements. Meanwhile, it also has broad application prospects in the semiconductor industry.Click to learn more CVD furnaces! Or click on online customer service to learn more about product information!