How to choose between PECVD electric furnace and CVD electric furnace?

The selection of PECVD electric furnace and CVD electric furnace depends on multiple factors, including deposition temperature, substrate material characteristics, deposition rate, film quality, equipment cost, and process complexity.

Sedimentation temperature:
CVD electric furnace: usually carried out at high temperatures, with a temperature range generally between 600 ° C and 1200 ° C, depending on the deposited material and reactants. Suitable for substrate materials that can withstand high temperatures.
PECVD electric furnace: With the help of plasma excitation of chemical precursor gas, deposition can be carried out at lower temperatures, from room temperature to 350 ° C. Especially suitable for temperature sensitive substrates such as organic materials and polymers.
Deposition rate and film quality:
CVD electric furnace: The deposition rate is relatively slow, but it can form high-quality thin films.
PECVD electric furnace: Due to the introduction of plasma, the deposition rate is fast and high-quality, high-density thin films can be prepared. Thin films have lower stress and stronger adhesion.
Equipment cost and process complexity:
CVD electric furnace: The equipment is relatively simple, the cost is low, and the process is relatively mature.
PECVD electric furnace: The equipment process is relatively complex and the cost is high, but it provides more process flexibility and control options.
Film performance regulation:
PECVD electric furnace: By adjusting the parameters of the plasma and deposition conditions, the performance of the deposited film can be controlled, including the crystallinity, refractive index, thickness, etc. of the film.
CVD electric furnace: Although the film properties can also be controlled by adjusting process parameters, the flexibility is relatively low.
Application areas:
CVD electric furnace: widely used in the semiconductor industry, solar cells, optical thin films, and hard coatings, especially suitable for applications that require high-temperature deposition.
PECVD electric furnace: It has a wide range of application prospects in the fields of semiconductor, optoelectronics, nanomaterials, graphene growth, carbon material growth, etc., especially suitable for occasions that require low-temperature deposition or complex thin film structures.
Summary:

Choosing a CVD electric furnace: If the substrate material can withstand high temperatures, and the requirements for deposition rate and film performance control are not particularly high, or if cost reduction is needed, then a CVD electric furnace is a suitable choice.
Choosing PECVD electric furnace: If the substrate material is temperature sensitive, or requires higher deposition rate, better film quality, and more flexible film performance control, then PECVD electric furnace is a more suitable choice.