Please provide a detailed explanation of the heat treatment temperature for the PECVD electric furnace coating system

The heat treatment temperature range of PECVD electric furnace coating system is usually between 200 and 450 ° C. The following is a detailed explanation of the heat treatment temperature for PECVD electric furnace coating system:

1. Temperature range and characteristics
Temperature range: Compared to traditional LPCVD technology, the process temperature of PECVD is significantly reduced, usually carried out within the range of 200-450 ° C. This temperature range enables PECVD to flexibly adapt to different deposition requirements and effectively reduce thermal damage to the sample.
Temperature control: PECVD electric furnace coating systems are usually equipped with high-precision temperature control systems, such as PID control temperature controllers, which can achieve multi-stage programmable control to ensure precise and reliable temperature control.

2. The influence of temperature on sedimentation process
Deposition rate: Heat treatment temperature is one of the important factors affecting sedimentation rate. Within a certain range, increasing the temperature can increase the deposition rate, as thermal energy is transferred to the gas and the kinetic energy of the gas increases, resulting in an increase in the density of atoms, neutral atomic groups, and plasma, and an increase in the amount deposited on the surface of the sample. However, when the temperature exceeds the optimal value for deposition, the number of functional groups reaching the surface of the sample will decrease, and the deposition rate will decrease.
Film quality: The heat treatment temperature can also affect the crystallinity, stress, refractive index, and other properties of the film. For example, when depositing silicon nitride thin films, the substrate temperature should generally be between 250 ℃ and 450 ℃. Silicon nitride films deposited below 250 ℃ may have significant intrinsic stress, while films deposited above 450 ℃ are prone to cracking.

3. Temperature optimization and process parameters
Process parameter optimization: In order to achieve the desired film characteristics, it is necessary to optimize the process parameters of the PECVD electric furnace coating system, including heat treatment temperature, RF power, gas flow rate, etc. By adjusting these parameters, the thickness, composition, and properties of the film can be precisely controlled.
In situ process control: PECVD systems typically have in-situ process monitoring capabilities that can adjust deposition parameters in real-time, including heat treatment temperature, to optimize film properties.

4. Precautions
Temperature uniformity: During the PECVD electric furnace coating process, it is necessary to ensure uniform temperature distribution inside the furnace to avoid uneven film performance caused by temperature gradients. This can be achieved by optimizing the furnace structure and heating element layout.
Safe operation: Due to the high temperature and plasma hazards involved in the PECVD electric furnace coating system, strict adherence to safety operating procedures is required during use to ensure the safety of equipment and operators.