What is PECVD coating electric furnace?

PECVD coating electric furnace is a device that uses plasma enhanced chemical vapor deposition (PECVD) technology for thin film deposition.

Slide PECVD tube furnace (click on the picture to view product details)

Working principle
PECVD technology generates plasma through methods such as glow discharge, causing gaseous substances containing thin films to undergo chemical reactions under the action of the plasma, thereby depositing the desired thin film on the surface of the sample. The electron density in plasma is high, and the temperature of the electron gas is many times higher than that of ordinary gas molecules. The reaction characteristics of this non-equilibrium plasma fundamentally change the energy supply mode of the reaction system.

Equipment Composition
The PECVD coating electric furnace mainly consists of the following parts:
Plasma source: used to generate high-energy electrons and heat gas to form plasma through electromagnetic field.
Reaction chamber: provides a space for thin film deposition, in which samples are placed for coating treatment.
Gas feeding device: used to introduce an appropriate amount of process gas, which undergoes chemical reactions under the action of plasma.
Vacuum pump: used to evacuate the reaction chamber to a high vacuum state to ensure the purity and stability of the coating process.
Control system: including temperature control, gas flow control, vacuum system control, etc., used to accurately control various parameters during the coating process.

Application area
PECVD coating electric furnaces have wide applications in multiple fields, including but not limited to:
In the field of automotive electronics, it is used for battery management system (BMS) protection, in vehicle sensor protection, headlight lens protection, and wear-resistant treatment of automotive interior parts.
Medical equipment field: used for surface protection of medical equipment such as hearing aids and medical mobile phones.
In the field of photovoltaic cells, it is used to prepare silicon nitride thin films to improve the conversion efficiency and service life of solar cells.
Semiconductor industry: used for depositing high-quality thin films, such as silicon dioxide and silicon nitride dielectrics, to improve the performance and reliability of integrated circuits.

Advantage
High deposition rate: Through radio frequency glow technology, PECVD coating electric furnace can significantly improve the deposition rate of thin films.
Good film-forming quality: The generated film has high adhesion, uniformity, and density.
Low process temperature: Compared to traditional chemical vapor deposition technology, PECVD technology can deposit at lower temperatures, reducing energy consumption and protecting temperature sensitive substrates.
Multifunctionality: PECVD coating electric furnace can not only be used for growing various thin films, but also for vacuum coating, nano film material preparation, and extended plasma cleaning and etching functions.

Key points for purchasing
When choosing a PECVD coating electric furnace, the following factors need to be considered:
Equipment performance: including whether parameters such as deposition rate, film quality, and process temperature meet production requirements.
Control system: Whether it has precise temperature control, gas flow control, and vacuum system control functions.
After sales service: Does the manufacturer provide high-quality after-sales service and technical support.
Price: Choose the appropriate equipment model and configuration based on budget and production needs.

Rotating and tilting PECVD electric furnace (click on the image to view product details)

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