Can CVD electric furnaces used in laboratories process semiconductors?

The CVD electric furnace used in the laboratory can indeed process semiconductors. CVD (Chemical Vapor Deposition) technology is an important semiconductor material processing technique that introduces one or more gaseous precursors into a high-temperature reaction chamber. These precursors decompose under appropriate temperature and pressure conditions to form the desired solid material, which is then deposited onto a substrate to form a continuous film layer.

In the semiconductor field, CVD electric furnaces are widely used, including but not limited to the following aspects:

Thin film deposition: CVD technology can be used to deposit various insulation layers, metal layers, and doping layers. For example, insulating layers such as silicon dioxide (SiO ₂) and silicon nitride (Si ∝ N ₄) play a role in electrical insulation, protection, and passivation in semiconductor devices; Metal layers such as tungsten (W), titanium (Ti), and aluminum (Al) are mainly used for interconnects and filling contact holes; Doping layers such as phosphosilicate glass (PSG) and borosilicate glass (BSG) are used for local doping and surface passivation to improve the performance of semiconductor devices.
Epitaxial growth: CVD electric furnaces are also used for epitaxial growth of single crystal silicon or other semiconductor materials (such as silicon carbide and gallium nitride), forming high-quality single crystal layers on the wafer surface, which is crucial for improving the performance and integration of semiconductor devices.
Special material deposition: CVD technology can also deposit high-k dielectric materials (such as hafnium oxide HfO ₂ and zirconium oxide ZrO ₂) as MOSFET gate dielectrics to reduce leakage current and improve device performance. In addition, it can also deposit barrier layers (such as titanium nitride TiN and tantalum nitride TaN) to prevent metal diffusion.
Preparation of nanomaterials and special materials: CVD technology can prepare nanomaterials such as nanoparticles, nanowires, carbon nanotubes, and graphene, which have wide applications in electronic devices and sensors.
Photovoltaic and LED manufacturing: In the photovoltaic field, CVD is used to manufacture thin-film solar cells (such as silicon thin films and compound semiconductor thin films CdTe, CIGS) to improve photoelectric conversion efficiency. In LED and laser manufacturing, CVD is used to deposit gallium nitride (GaN) and other III-V compound semiconductors.
Micro Electro Mechanical Systems (MEMS) and Gas Sensors: CVD technology is also used for material deposition in MEMS manufacturing, as well as for sensitive thin film deposition in metal oxide semiconductor gas sensors, achieving high-sensitivity detection.
In summary, CVD electric furnaces used in laboratories have broad application prospects and important technical value in semiconductor processing.