Vacuum RTP rapid annealing furnace

Vacuum RTP (Rapid Thermal Processing) rapid annealing furnace is a commonly used heat treatment equipment, mainly used in semiconductor manufacturing, materials science research, nanotechnology and other fields.

Commonly used RTP fast annealing furnace (click on the image to view product details)

1. Working principle
The vacuum RTP rapid annealing furnace utilizes efficient heat sources such as resistance wire electric heating to rapidly heat wafers or materials to high temperatures (up to 1200 ℃ or higher) through an extremely fast heating rate (up to 150 ℃/second or higher), and rapidly cool them in a high vacuum environment. This rapid heat treatment process can eliminate internal defects in materials, improve crystal structure and optoelectronic properties.
2. Main features
High vacuum degree: The equipment has high vacuum capability, which can effectively reduce the oxygen and water vapor content in the air inside the furnace, avoiding adverse reactions such as oxidation of materials at high temperatures.
Rapid temperature rise and fall: Adopting a good heating and cooling system to achieve rapid heating and cooling of materials and shorten the process cycle.
High precision temperature control: Adopting high-precision temperature control technologies such as PID closed-loop control, ensuring the stability and uniformity of the temperature inside the furnace, and meeting high-precision process requirements.
Multifunctionality: Suitable for various heat treatment processes, such as rapid annealing, rapid thermal oxidation, rapid thermal nitriding, etc.
Compact design: usually adopts a desktop design, occupies a small area, and is easy to use in laboratories or small production environments.
3. Application Fields
Semiconductor manufacturing: used for back-end processes of CMOS devices, preparation of GaN thin films, crystal growth of SiC materials, and annealing after polishing to improve the performance and reliability of semiconductor devices.
Materials Science Research: In the field of materials science research, the vacuum RTP rapid annealing furnace can be used to study the phase transition, crystal growth, heat treatment effects, etc. of materials, providing strong support for the development of materials science.
Nanotechnology: In the synthesis and research process of nanomaterials, this device can be used to control the crystal structure and morphology of materials, adjust their photoelectric and magnetic properties, and other characteristics.
Thin film growth: used for the growth and regulation of polycrystalline silicon thin films, silicon nitride thin films, and other thin films, achieving crystallization and quality improvement through rapid annealing.
4. Maintenance and upkeep
Regular inspection: Regularly check the status of key components such as heating elements, vacuum pumps, temperature sensors, etc. to ensure the normal operation of the equipment.
Cleaning and maintenance: Keep the interior of the equipment clean and dry, avoiding the entry of moisture and impurities. Regularly clean heating elements and vacuum chambers and other components.
Replace consumables: According to the requirements of the equipment manual, regularly replace consumables such as heating elements and vacuum pump oil to ensure equipment performance and stability.
In summary, the vacuum RTP rapid annealing furnace is a powerful and high-performance heat treatment equipment with broad application prospects in semiconductor manufacturing, materials science research, nanotechnology, and other fields.Click to learn more tube furnaces! Or click on online customer service to learn more about product information!