What is the general heat treatment temperature for RTP rapid annealing furnace?

RTP (Rapid Thermal Processing) is a device used for semiconductor material processing, characterized by heating silicon wafers to a specific temperature range in a very short period of time. What is the general heat treatment temperature for RTP rapid annealing furnace? Let’s take a look below!

Commonly used RTP fast annealing furnace (click on the image to view product details)

1. Temperature range
The temperature range of RTP rapid annealing furnaces is usually wide, covering different intervals from lower temperatures to higher temperatures. Specifically, the temperature range is generally between 400 ℃ and 1300 ℃, but there are also devices that can provide slightly different temperature ranges, such as 150 ℃ and 1300 ℃ (it is recommended to use a temperature range of 150 ℃ -1250 ℃).
2. Common temperature
In practical applications, the heat treatment temperature of RTP rapid annealing furnace will be adjusted according to specific process requirements. For example, in integrated circuit manufacturing, RTP devices are commonly used to repair damage caused by ion implantation, activate doped protons, and effectively suppress impurity diffusion. Generally speaking, the temperature for repairing lattice defects is about 500 ℃, while activating doped atoms requires 950 ℃.
3. Temperature control accuracy
RTP rapid annealing furnace not only has a wide temperature range, but also has high temperature control accuracy. It can precisely control the temperature of the sample and achieve high-quality heat treatment. This precise temperature control is important for ensuring the performance and quality of semiconductor materials.
4. Influencing factors
The heat treatment temperature of RTP rapid annealing furnace is also affected by other factors, such as heating rate, cooling rate, atmosphere (such as nitrogen, inert gas, etc.), and the size and shape of the sample. These factors may all have an impact on the heat treatment effect, so when selecting and using RTP rapid annealing furnaces, it is necessary to consider them comprehensively according to specific process requirements.

RTP fast annealing furnace for slide (click on the image to view product details)

So, the general heat treatment temperature range of RTP rapid annealing furnace is relatively wide, usually 400 ℃~1300 ℃ (or different according to specific equipment), and the specific temperature is adjusted according to process requirements. In practical applications, it is necessary to comprehensively consider multiple factors to determine the appropriate heat treatment temperature.Click to learn more tube furnaces! Or click on online customer service to learn more about product information!