What is the typical temperature for CVD vacuum coating system?

The temperature range of CVD (Chemical Vapor Deposition) vacuum coating system usually depends on various factors such as the deposited material, precursor, reaction conditions, and deposition process. Therefore, it is impossible to provide a unified temperature value. However, based on publicly available information, several common temperature ranges and application scenarios can be summarized:
1. Common temperature range
Low temperature range:
Below 500 ° C: It belongs to low-temperature CVD coating and is commonly used in the production of insulation films, especially in the production of aluminum wiring surface protective films, inter line insulation films, and other film layers in integrated circuits.
Medium temperature range:
600 ° C~800 ° C: This temperature range is suitable for the production of various insulation films, polycrystalline silicon films, metal films in integrated circuits, and other film layers.
High temperature range:
900 ° C~1100 ° C: Some CVD processes require higher temperatures, such as when used to prepare high-purity, high-density thin films.
1300 ° C~2200 ° C: Especially when preparing high-quality silicon carbide (SiC) films, it is necessary to perform at very high temperatures to ensure the quality and performance of the films.
2. Specific materials and application examples
Polycrystalline silicon deposition:
Temperature range: approximately 600 ° C to 650 ° C.
Applications: Epitaxial growth of silicon chips, manufacturing of solar cells, etc.
Silicon carbide (SiC) deposition:
Temperature range: Usually between 1500 ° C and 2200 ° C, high-temperature cracking is performed first, followed by deposition at lower temperatures (such as 1000 ° C~1300 ° C).
Application: High temperature structural materials, wear-resistant coatings, etc.
Metal CVD:
Temperature range: ranging from low temperatures (such as copper around 150 ° C) to high temperatures (such as tungsten above 700 ° C).
Application: Conductive layer, reflective layer, decorative coating and other fields.
Deposition of silicon nitride (Si ∝ N ₄):
Temperature range: approximately 450 ° C to 750 ° C.
Applications: Low dielectric constant materials, microelectronics manufacturing, battery materials, chemical sensors, and other fields.
3. Precautions
It should be noted that the above temperature range is only an example and may vary in practical applications due to factors such as materials, processes, and equipment.
The selection of temperature is a key parameter in CVD coating, which directly affects the quality, structure, and properties of the film. Therefore, when selecting temperature, it is necessary to comprehensively consider various factors such as material characteristics, reaction conditions, process requirements, and equipment capabilities.
In summary, the temperature range of CVD vacuum coating system is wide, and the specific temperature depends on various factors. In practical applications, selection and adjustment need to be made according to specific circumstances.