CVD furnace compose by tube furnace, gas system and vacuum system.
CVD called Chemical Vapor Deposition, it is gas phase reaction under high temperature, for example, organic metal, metal halide, hydrocarbons, such as thermal decomposition, hydrogen reduction or make it a mixture of gases under high temperature was biochemistry reaction to the inorganic materials such as metal, oxide, carbide precipitation method. This technique was originally developed as a means of coating, but not only applied to the coating of heat resistant material, and applied to the refining of high purity metal, powder synthesis and semiconductor thin films, etc., is a very technical field.
CVD furnace technical characteristics: (1) high melting point material can were synthesized under the low temperature; 2 precipitate material form in single crystal, polycrystalline, whisker, powder, film, etc;(3) not only can be coated on the substrate, but also on the powder surface coatings, etc. Can synthesis of high melting point material, especially in the low temperature has made a contribution in the aspect of energy conservation, as a new technology is promising
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lab furnace and
dental furnace.