Website navigation

TECHNICAL

Position:Home > Technical
  • What is the difference between a vacuum tube furnace and a regular tube furnace?There are significant differences between vacuum tube furnaces and ordinary tube furnaces in multiple aspects, mainly reflected in their working principles, applicable ranges, heating methods, temperature control, power, and application fields. The following is a detailed analysis of the differences between the two:

    07-18

  • How to choose a vacuum tube furnace?When choosing a vacuum tube furnace, multiple factors need to be considered to ensure that the selected equipment can meet the specific needs of experiments or production. Here are some key selection points:

    07-18

  • What are the application scenarios of vacuum tube furnaces?The vacuum tube furnace, as a heating device that operates in a highly vacuum environment, has a wide range of application scenarios. The following are some main application scenarios of vacuum tube furnaces:

    07-18

  • What is a vacuum tube furnace?A vacuum tube furnace is a heating device that operates in a highly vacuum environment, and its core principle is to use infrared radiation to heat materials. The following is a detailed analysis of the vacuum tube furnace:

    07-18

  • How to choose an industrial vacuum furnace?The selection of industrial vacuum furnaces is a comprehensive consideration process involving multiple factors. Here are some key steps and points to help you make a reasonable choice:

    07-17

  • What is the working principle of CVD equipment?The working principle of CVD (Chemical Vapor Deposition) equipment is mainly based on the chemical reaction of gaseous or vapor substances at the gas phase or gas-solid interface, generating solid deposits and depositing them on the substrate surface. The following is a detailed explanation of the working principle of CVD equipment:

    07-17

  • What are the typical components of CVD equipment?CVD (Chemical Vapor Deposition) equipment generally consists of multiple key components to achieve the process of depositing gaseous reactants to form thin films on solid substrates. The following are the main components of CVD equipment:

    07-17

  • What generally affects the thickness of CVD films?The thickness of CVD (Chemical Vapor Deposition) films is influenced by various factors, which collectively determine the final thickness and quality of the films. Here are some of the main influencing factors:

    07-17

  • Which is more suitable for depositing ultra-thin layer thickness, CVD or PECVD?In terms of depositing ultra-thin layer thickness, PECVD (Plasma Enhanced Chemical Vapor Deposition) usually has more advantages than traditional CVD (Chemical Vapor Deposition). The following is a specific analysis:

    07-17

  • What is the difference between CVD and PECVD?CVD (Chemical Vapor Deposition) and PECVD (Plasma Enhanced Chemical Vapor Deposition) are two widely used thin film deposition techniques in the fields of materials science and engineering. There are several key differences between them, and the following is a detailed analysis of these differences:

    07-17

Contact Information

E-mail:
web@kejiafurnace.com
Address:
No.18 Hongye Road, Hi-tech zone , Zhengzhou, China, 450000
QQ tel Email WhatApp FaceBook

Tel Number

181-3719-5600

Email

web@kejiafurnace.com

WhatsApp

+86/18037178440

FaceBook

Zhengzhou/Kejia

kejialiuyan