What are the advantages of laboratory tubular PECVD electric furnace?The laboratory tubular PECVD electric furnace combines the advantages of tubular furnace and plasma enhanced chemical vapor deposition (PECVD) technology, demonstrating significant advantages in fields such as new energy material preparation and semiconductor device development. The following is a detailed analysis of its core advantages:
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Can laboratory tubular PECVD electric furnace have multiple temperature zones?The laboratory tubular PECVD electric furnace can be designed with multiple temperature zones, which can meet complex process requirements and improve the uniformity and quality of thin film deposition. The following is a detailed explanation of multi temperature zone design:
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Temperature of laboratory tubular PECVD electric furnaceThe temperature range of the laboratory tubular PECVD electric furnace is wide, with common operating temperatures ranging from 200 ℃ to 450 ℃, and the highest temperature can reach 1200 ℃ or even higher (such as 1600 ℃), depending on the equipment model, deposition material, and process requirements. The following provides a detailed explanation from four aspects: temperature range, typical applications, temperature control technology, and temperature uniformity:
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Application of laboratory tubular PECVD electric furnace in the new energy industryThe laboratory tubular PECVD electric furnace is widely and crucially used in the new energy industry, mainly reflected in various aspects such as solar cells, fuel cells, energy storage materials, research and development of new energy materials, and recycling and processing. The following is a detailed explanation of its specific applications:
Application industry of laboratory tubular PECVD electric furnaceThe laboratory tubular PECVD electric furnace is widely used in various industries such as semiconductors, optoelectronics, consumer electronics, automotive electronics, photovoltaics, industrial control, medicine, military industry, energy, scientific research and education due to its unique advantages of low-temperature deposition, high uniformity, and high adhesion. The specific applications are as follows:
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Principle of laboratory tubular PECVD electric furnaceThe principle of laboratory tubular PECVD electric furnace is based on plasma enhanced chemical vapor deposition (PECVD) technology. Its core is to generate plasma by exciting gas with radio frequency or microwave, and use the high activity of plasma to promote chemical reactions, achieving thin film deposition at low temperatures. The following are its specific principles and processes:
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What kind of film can be deposited on a laboratory tubular PECVD electric furnace?The laboratory tubular PECVD electric furnace can deposit various types of thin films on various substrates through plasma enhanced chemical vapor deposition technology. The coating types are wide and the performance is excellent. The specific coating types and characteristics are as follows:
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Laboratory tube PECVD electric furnaceThe laboratory tube PECVD electric furnace is an experimental equipment that uses plasma enhanced chemical vapor deposition (PECVD) technology for thin film deposition. Let’s take a detailed look at this type of product below!
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High temperature tube furnace temperature for small experimentsThe temperature range of small experimental high-temperature tube furnaces is usually between 1000 ℃ and 1600 ℃, and some high-end models can reach 1700 ℃ or even higher, depending on equipment design, heating element materials, and experimental requirements. The following is a detailed analysis:
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